Asml Netherlands B.v.

Budiman Sutedja

Cheng-Qun Gui

Peter Ten Berge

Enno Van Den Brink

Rudy Jan Maria Pellens

Keith Frank Best

Paulus Wilhelmus Leonardus Van Dijk

Johannes Paulus Adrianus Maria Van Den Heuvel

According to an aspect of the present invention, there is provided a lithographic apparatus that includes a substrate carrier arranged to hold a substrate in position using an electrostatic force. The substrate carrier is provided with an integral power source. The apparatus also includes a substrate table for holding the substrate carrier.

Lithographic apparatus and method

A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Venlo, Netherlands

Budiman Sutedja