Company Filing History:
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1 out of 832,843 Years Active: 2004-2010
Title: Innovations of Bryan J Rice
Introduction
Bryan J Rice is a notable inventor based in Hillsboro, OR (US), recognized for his significant contributions to the field of extreme ultraviolet (EUV) lithography. With a total of 16 patents to his name, Rice has made substantial advancements in technology that enhance the efficiency and effectiveness of EUV light sources.
Latest Patents
Among his latest patents is a groundbreaking invention titled "Plasma-based debris mitigation for extreme ultraviolet (EUV) light source." This patent describes a light source chamber in an EUV lithography system that incorporates a secondary plasma to ionize debris particles generated by the light source. Additionally, it features a foil trap designed to capture these ionized particles, thereby preventing contamination of the collector optics within the chamber. Another significant patent is the "Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system." This invention utilizes passivation coatings and gettering agents to mitigate contamination from tin vapor, which is used as a plasma 'fuel' in EUV sources. The passivation coating is a material that tin does not adhere to, and it is strategically placed on reflective surfaces within the source chamber. The gettering agent reacts strongly with tin and is positioned outside the collector mirrors and on non-reflective surfaces to enhance performance.
Career Highlights
Bryan J Rice has had a distinguished career, working with prominent organizations such as Intel Corporation and the United States of America as represented by the Department of Energy. His work in these institutions has allowed him to develop innovative solutions that address critical challenges in the field of lithography.
Collaborations
Throughout his career, Rice has collaborated with esteemed colleagues, including Robert L Bristol and Manish Chandhok. These partnerships have fostered an environment of innovation and have contributed to the success of his projects.
Conclusion
Bryan J Rice's contributions to the field of EUV lithography through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in technology, ensuring that he remains a significant figure in the industry.