The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Dec. 31, 2002
Bryan J. Rice, Hillsboro, OR (US);
Kramadhati V. Ravi, Atherton, CA (US);
Bryan J. Rice, Hillsboro, OR (US);
Kramadhati V. Ravi, Atherton, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A diamond insulator collar and methods for fabricating a diamond insulator collar for electrical discharge gas plasma EUV source. The insulating collar is positioned at the base of the central electrode in the pre-ionization region of the plasma head. The insulating collar prevents electrical shorting between the outer electrode and the central electrode in this region. In one embodiment of a method for providing a wire mesh-reinforced diamond insulator collar, a mandrel is provided that replicates the shape of the base of the central electrode. A wire mesh is wrapped around the mandrel conforming to the shape of the mandrel. The wire mesh is coated with electrically insulating diamond using known plasma enhanced chemical vapor deposition (CVD) techniques to form a non-porous coating. The mandrel is removed from the diamond-coated wire mesh providing a porous-free wire-reinforced diamond insulator collar. Embodiments of non-wire reinforced collars are presented.