The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Jul. 24, 2003
Applicants:
David Ruzic, Urbana, IL (US);
Robert Bristol, Portland, OR (US);
Bryan J. Rice, Hillsboro, OR (US);
Inventors:
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/10 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber.
Ruzic, David. (2007). Plasma-based debris mitigation for extreme ultraviolet (euv) light source (U.S. Patent No. 7230258). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7230258
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile