Company Filing History:
Years Active: 2005-2006
Title: Bruce Luttrell: Innovator in Lithography Processes
Introduction
Bruce Luttrell is a notable inventor based in San Jose, CA, who has made significant contributions to the field of lithography processes used in integrated circuit manufacturing. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of lithographic techniques.
Latest Patents
Luttrell's latest patents include innovative systems designed to enhance the fracturing of polygons used in lithography. One of his patents, titled "Fracturing polygons used in a lithography process for fabricating an integrated circuit," presents a system that addresses the challenges posed by notches in polygon layouts. This system effectively eliminates undesirable slivers that can hinder exposure during the lithographic process. Another patent, "Method and apparatus for fracturing polygons on masks used in an optical lithography process," describes a method for fracturing polygons by analyzing the aspect ratio of prospective slices. This approach ensures that the resulting sub-polygons are suitable for printing, thereby improving the overall quality of the lithographic output.
Career Highlights
Throughout his career, Bruce Luttrell has worked with prominent companies in the technology sector. He has held positions at Synopsys, Inc. and Numerical Technologies, Inc., where he has contributed to advancements in semiconductor manufacturing technologies.
Collaborations
Due to space constraints, the details of collaborations will not be included.
Conclusion
Bruce Luttrell's innovative work in lithography processes has significantly impacted the field of integrated circuit manufacturing. His patents reflect a deep understanding of the challenges in lithographic techniques and offer practical solutions to enhance production efficiency.