The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Apr. 10, 2003
Applicant:
Bruce Luttrell, San Jose, CA (US);
Inventor:
Bruce Luttrell, San Jose, CA (US);
Assignee:
Synopsys, Inc., Mountain View, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system is provided for fracturing a polygon on a mask layout used in a lithographic process for manufacturing an integrated circuit. The system receives mask layouts that include polygons that may include holes with exit routes near notches either on the outside of the polygon or internal to the hole. A notch is undesirable because fracturing the polygon for printing by the lithographic equipment can create slivers that do not expose well during exposure. The system moves the exit route for a vertex trace so that the exit route passes through a vertex of the notch thereby eliminating the sliver.