Sunnyvale, CA, United States of America

Bret W Adams


Average Co-Inventor Count = 3.9

ph-index = 9

Forward Citations = 225(Granted Patents)


Company Filing History:


Years Active: 1999-2013

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14 patents (USPTO):Explore Patents

Title: **Bret W. Adams: Innovator in Chemical Mechanical Polishing**

Introduction

Bret W. Adams, based in Sunnyvale, California, is a notable inventor recognized for his contributions to the field of process control in chemical mechanical polishing. With an impressive portfolio of 14 patents, Adams has made significant strides in enhancing the efficiency and precision of polishing techniques used in the semiconductor industry.

Latest Patents

Adams' latest patents reflect his expertise in computer-implemented methods for process control. One such patent is focused on a method for accurately measuring the initial pre-polishing thickness of a substrate at a metrology station. This process involves determining a parameter of an endpoint algorithm based on the initial thickness, followed by polishing the substrate at a polishing station until an endpoint criterion is detected. His innovative approaches optimize the polishing process, ensuring high-quality outcomes in semiconductor fabrication.

Career Highlights

Throughout his career, Bret W. Adams has worked with prominent companies in the technology industry, including Applied Materials, Inc. and Motorola, Inc. His roles in these organizations have enabled him to apply his inventive ideas to real-world applications, thus advancing the development of cutting-edge technologies in semiconductor manufacturing.

Collaborations

Adams has collaborated with esteemed professionals such as Manoocher Birang and Boguslaw A. Swedek. These collaborations have fostered a creative environment that promotes the exchange of ideas and innovations, further enriching the field of process control for chemical mechanical polishing.

Conclusion

Bret W. Adams continues to be a driving force in the realm of innovations within the semiconductor industry. His patents and collaborative efforts are paving the way for future advancements and provide significant contributions to the ongoing development of efficient polishing techniques. Adams' work not only reflects his genius as an inventor but also illustrates the importance of teamwork in achieving cutting-edge technology solutions.

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