The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2003
Filed:
Jan. 10, 2003
Bret W. Adams, Sunnyvale, CA (US);
Boguslaw A. Swedek, San Jose, CA (US);
Rajeev Bajaj, Fremont, CA (US);
Savitha Nanjangud, San Jose, CA (US);
Andreas Norbert Wiswesser, Mountain View, CA (US);
Stan D. Tsai, Fremont, CA (US);
David A. Chan, Sunnyvale, CA (US);
Fred C. Redeker, Fremont, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Applied Materials Inc., Santa Clara, CA (US);
Abstract
An optical monitoring system for a two-step polishing process which generates a reflectance trace for each of plurality of radial zones. The CMP apparatus may switch from a high-selectivity slurry to a low-selectivity slurry when any of the reflectance traces indicate initial clearance of the metal layer, and polishing may halt when all of the reflectance traces indicate that oxide layer has been completely exposed.