The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 1999

Filed:

May. 12, 1997
Applicant:
Inventors:

David Datong Huo, Campbell, CA (US);

Bret W Adams, Sunnyvale, CA (US);

John Jarvis, East Kilbride, GB;

Assignees:

Applied Materials, Inc., Santa Clara, CA (US);

Motorala, Inc., Schaumberg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K / ;
U.S. Cl.
CPC ...
137-1 ; 251 11 ; 2361 / ; 236 / ;
Abstract

Apparatus, positioned at an inlet port to a pump, for shielding the pump from a process chamber of a semiconductor wafer processing system, where the apparatus has a controllably variable effective throughput area, and method for electrically controlling the size of the effective throughput area. Specifically, the apparatus is a controllable restrictor shield supported by an actuator, having a first effective throughput area and a second effective throughput area, where the first effective throughput area is typically less than the second effective throughput area. The size of the effective throughput area is directly responsive to an electric signal that controls the actuator.


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