Taipei, Taiwan

Bi-Ling Chen


Average Co-Inventor Count = 3.1

ph-index = 7

Forward Citations = 281(Granted Patents)


Company Filing History:


Years Active: 1999-2003

Loading Chart...
14 patents (USPTO):

Title: Bi-Ling Chen: Innovator in Microelectronics Fabrication

Introduction

Bi-Ling Chen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of microelectronics, holding a total of 14 patents. His work focuses on innovative methods for semiconductor fabrication, particularly in the area of shallow trench isolation and etching processes.

Latest Patents

One of Bi-Ling Chen's latest patents is a method of forming shallow trench isolation with rounded corners and divot-free by using in-situ formed spacers. This method involves several steps, including providing a silicon structure with a pad oxide layer, forming a hard mask layer, and patterning these layers to create an opening that exposes a portion of the silicon structure. The process continues with the formation of a spacer layer and an STI trench etching process, ultimately resulting in a divot-free STI structure with rounded corners. Another notable patent involves a method for etching a pattern within a silicon-containing dielectric layer upon a substrate. This method employs a plasma-activated reactive gas mixture, allowing for precise control over the etch rate and selectivity.

Career Highlights

Bi-Ling Chen has worked with leading companies in the semiconductor industry, including Vanguard International Semiconductor Corporation and Taiwan Semiconductor Manufacturing Company. His experience in these organizations has allowed him to develop and refine his innovative techniques in microelectronics fabrication.

Collaborations

Throughout his career, Bi-Ling Chen has collaborated with notable professionals in the field, including Erik S. Jeng and Hao-Chieh Liu. These collaborations have contributed to the advancement of technology in semiconductor manufacturing.

Conclusion

Bi-Ling Chen's contributions to microelectronics fabrication through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of advanced semiconductor technologies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…