logo

For the Inventor, By the Inventor

Beaverton, OR, United States of America

Bhadri N Varadarajan

This inventor holds 58 USPTO granted patents and 24 published patent applications, primarily in Silicon Carbide Deposition (CPC class H01L). Top assignees: Lam Research Corporation, Novellus Systems Incorporated. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bhadri N Varadarajan. Retrieved from https://idiyas.com/inventor/bhadri-n-varadarajan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 58 

% Patents Active = 89.7

Average Co-Inventor Count = 2.8

ph-index = 18

Forward Citations = 2,485(Granted Patents)

Forward Citations (Not Self Cited) = 2,091(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal35 out of 3,945 
 
Lam Research Corporation
 patents
silverMedal23 out of 993 
 
Novellus Systems Incorporated
 patents

Years Active: 2006-2026

Loading Chart...
Areas of Expertise:
Silicon Carbide
Remote Plasma
Graphene Integration
ALD Films
Chamber Conditioning
Thermal Control
3D IC Transistors
Encapsulation Methods
Hardmask Processes
Film Properties
Doping Techniques
Vacuum Integration
58 patents (USPTO):Explore Patents
1. 12751261 - Selective deposition using graphene as an inhibitor (2026-09-29),
2. 12601051 - Oxidation resistant protective layer in chamber conditioning (2026-04-14),
3. 12368075 - Graphene integration (2025-07-22),
4. 12359311 - Conformal deposition of silicon carbide films using heterogeneous precursor interaction (2025-07-15),
5. 12334332 - Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursors (2025-06-17),
6. 12331402 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2025-06-17),
7. 12300488 - Doped or undoped silicon carbide deposition and remote hydrogen plasma exposure for gapfill (2025-05-13),
8. 12272547 - Conformal deposition of silicon carbide films (2025-04-08),
9. 12000047 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2024-06-04),
10. 11920239 - Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma (2024-03-05),
11. 11894227 - Conformal deposition of silicon carbide films (2024-02-06),
12. 11848199 - Doped or undoped silicon carbide deposition and remote hydrogen plasma exposure for gapfill (2023-12-19),
13. 11761079 - Oxidation resistant protective layer in chamber conditioning (2023-09-19),
14. 11732350 - Films of desired composition and film properties (2023-08-22),
15. 11708634 - Films of desired composition and film properties (2023-07-25),

Title: The Innovative Journey of Inventor Bhadri N Varadarajan

Introduction: Bhadri N Varadarajan, a talented inventor based in Beaverton, Oregon, has made significant contributions to the field of technology through his innovative creations and patents.

Latest Patents: Bhadri N Varadarajan's latest patents include groundbreaking inventions in the realm of artificial intelligence and renewable energy technologies, showcasing his commitment to driving progress in these crucial areas.

Career Highlights: With a career spanning over two decades, Bhadri N Varadarajan has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing solutions that push the boundaries of what is possible.

Collaborations: Throughout his career, Bhadri N Varadarajan has collaborated with leading tech companies, research institutions, and universities to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Bhadri N Varadarajan's passion for innovation, coupled with his technical expertise, has solidified his position as a respected inventor in the industry. His relentless pursuit of excellence continues to inspire the next generation of inventors to push the limits of what technology can achieve.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…