This inventor holds 39 USPTO granted patents and 12 published patent applications, primarily in Chemical Mechanical Polishing. Top assignees: Rohm and Haas Electronic Materials Cmp Holdings, Inc., Dow Global Technolgoies LLC, Nitta Haas Inc.. Active years: 2015-2025.
Location History:
- Newark, DE (2017)
- Newark, DE (US) (2015 - 2023)
Company Filing History:
38 out of 311Â 
23 out of 4,798Â 
2 out of 23Â Years Active: 2015-2025
Areas of Expertise:
Title: The Innovations of Bainian Qian: A Pioneer in Chemical Mechanical Polishing
Introduction
Bainian Qian, a prominent inventor based in Newark, DE, has made significant contributions to the field of chemical mechanical polishing. With an impressive portfolio of 37 patents, Qian is recognized for his innovative approaches and developments that have advanced the technology used in polishing applications.
Latest Patents
Among his latest inventions, Qian has developed a chemical mechanical polishing pad that features a unique polishing layer composed of an extruded sheet. This extruded sheet is formulated from a photopolymerizable composition, which includes a block copolymer, a UV curable acrylate, and a photoinitiator. Another notable patent involves the preparation of this polishing pad, where the compounded photopolymerizable composition is extruded and subsequently cured through exposure to UV light. These innovations have greatly enhanced the efficiency and effectiveness of polishing processes in various industries.
Career Highlights
Qian has held key positions in reputable companies such as Rohm and Haas Electronic Materials CMP Holdings, Inc. and Dow Global Technologies LLC. His work in these organizations has not only bolstered his expertise but has also facilitated the practical application of his inventions, impacting the market and leading to advancements in polishing technologies.
Collaborations
Throughout his career, Bainian Qian has collaborated with esteemed colleagues, including Marty W. DeGroot and George C. Jacob. These partnerships have contributed to the richness of his research and development efforts, fostering a collaborative environment that encourages innovation.
Conclusion
Bainian Qian's dedication to advancing chemical mechanical polishing technology through his numerous patents underscores his status as a leading inventor in the field. His continued innovation promises to influence the future of polishing applications, benefiting industries that rely on precise surface finishing.