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For the Inventor, By the Inventor

Bedford Hills, NY, United States of America

Bachir Dirahoui

USPTO Granted Patents = 10

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 33(Granted Patents)


Location History:

  • Mount Kisco, NY (US) (2001 - 2002)
  • Bedford Hills, NY (US) (2004 - 2020)

Company Filing History:

goldMedal10 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 2001-2020

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):
1. 10573526 - Method of charge controlled patterning during reactive ion etching (2020-02-25),
2. 9496148 - Method of charge controlled patterning during reactive ion etching (2016-11-15),
3. 9087927 - Thermally stable high-K tetragonal HFO2 layer within high aspect ratio deep trenches (2015-07-21),
4. 8901706 - [object Object] (2014-12-02),
5. 7790553 - Methods for forming high performance gates and structures thereof (2010-09-07),
6. 7358130 - Method for monitoring lateral encroachment of spacer process on a CD SEM (2008-04-15),
7. 7105398 - Method for monitoring lateral encroachment of spacer process on a CD SEM (2006-09-12),
8. 6800530 - Triple layer hard mask for gate patterning to fabricate scaled CMOS transistors (2004-10-05),
9. 6492259 - Process for making a planar integrated circuit interconnect (2002-12-10),
10. 6281583 - Planar integrated circuit interconnect (2001-08-28),

Title: Innovator Profile: Bachir Dirahoui - Enhancing Semiconductor Manufacturing in Bedford Hills, NY

Introduction:

Bachir Dirahoui is a prolific inventor based in Bedford Hills, NY, with an impressive portfolio of 10 patents in the field of semiconductor processing. His innovative methods have significantly contributed to the advancement of plasma processing technologies.

Latest Patents:

Among his latest patents is the "Method of Charge Controlled Patterning during Reactive Ion Etching," which revolutionizes the way semiconductor wafers are etched. This patent introduces a novel approach to reduce charge flow in the semiconductor wafer during plasma etching, ensuring precise control over the patterning process.

Career Highlights:

Bachir Dirahoui is a valued member of the International Business Machines Corporation (IBM), where he plays a pivotal role in research and development. His expertise in semiconductor manufacturing has led to the successful implementation of cutting-edge technologies in IBM's operations.

Collaborations:

Dirahoui collaborates closely with esteemed colleagues such as Daniel C. Edelstein and Robert C. Greenlese. Together, they form a dynamic team driving innovation and excellence in semiconductor processing at IBM.

Conclusion:

In conclusion, Bachir Dirahoui's dedication to pushing the boundaries of semiconductor manufacturing is evident in his numerous patents and contributions to the industry. His pioneering work continues to inspire advancements in plasma processing technologies, solidifying his position as a visionary inventor in the field.

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