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For the Inventor, By the Inventor

Plano, TX, United States of America

Ashutosh Misra

This inventor holds 22 USPTO granted patents and 4 published patent applications and 3 EPO patents, primarily in Chemical Processing. Top assignees: Air Liquide America, L.p., Air Liquide Electronics U.S. LP, Texas Instruments Corporation. Active years: 2000-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ashutosh Misra. Retrieved from https://idiyas.com/inventor/ashutosh-misra-8e8ao674

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 54.5

 

Average Co-Inventor Count = 2.3

ph-index = 8

Forward Citations = 960(Granted Patents)


Location History:

  • Denton, TX (US) (2000)
  • Dallas, TX (US) (2000 - 2003)
  • Plano, TX (US) (2002 - 2015)

Company Filing History:

goldMedal9 out of 73 
 
Air Liquide America, L.p.
 patents
silverMedal9 out of 37 
 
Air Liquide Electronics U.S. LP
 patents
bronzeMedal2 out of 29,888 
 
Texas Instruments Corporation
 patents
4. 1 out of 340 
 
American Air Liquide, Inc.
 patents
5. 1 out of 295 
 
L'air Liquide, Societe Anonyme a Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
6. 1 out of 1,527 
 
L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
 patents
7. 1 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2000-2015

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Areas of Expertise:
Carbosilanes
Ruthenium-based Film
CVD
Chemical-Mechanical Planarization
Silicon Precursors
Plasma Cleaning
Slurry Compositions
Alkaline Chemistry
Dielectric Films
Absorption Spectroscopy
Metallic Arrays
Etching Techniques
22 patents (USPTO):Explore Patents
1. 9073952 - Synthesis method for carbosilanes (2015-07-07),
2. 8435428 - Methods for forming a ruthenium-based film on a substrate (2013-05-07),
3. 8227358 - Silicon precursors and method for low temperature CVD of silicon-containing films (2012-07-24),
4. 8101788 - Silicon precursors and method for low temperature CVD of silicon-containing films (2012-01-24),
5. 7906175 - Methods for forming a ruthenium-based film on a substrate (2011-03-15),
6. 7770448 - Chemical storage device with integrated load cell (2010-08-10),
7. 7498295 - Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide (2009-03-03),
8. 7482286 - Method for forming dielectric or metallic films (2009-01-27),
9. 7435712 - Alkaline chemistry for post-CMP cleaning (2008-10-14),
10. 7297670 - Acidic chemistry for Post-CMP cleaning using a composition comprising mercaptopropionic acid (2007-11-20),
11. 7293569 - Alkylsilanes as solvents for low vapor pressure precursors (2007-11-13),
12. 7098150 - Method for novel deposition of high-k MSiON dielectric films (2006-08-29),
13. 7087564 - Acidic chemistry for post-CMP cleaning (2006-08-08),
14. 6943878 - Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy (2005-09-13),
15. 6762832 - Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy (2004-07-13),

Title: Innovations and Achievements of Ashutosh Misra

Introduction

Ashutosh Misra is an accomplished inventor based in Plano, TX, with a notable portfolio of 22 patents. His work primarily focuses on advanced synthesis methods and semiconductor processes, demonstrating a strong commitment to innovation in the field of materials science.

Latest Patents

Among his latest contributions to technology, Ashutosh has developed a synthesis method for carbosilanes. This method involves synthesizing Si(OEt)[CH—Si(OEt)] compounds through the reaction of a Grignard reagent, represented as Si(OEt)(CHMgCl), with a quenching agent, Si(OEt)Cl. Additionally, he has patented methods for forming a ruthenium-based film on substrates. This process is critical in semiconductor manufacturing, utilizing a reaction chamber where a substrate is treated with a ruthenium-based precursor that includes ruthenium tetroxide dissolved in non-flammable fluorinated solvents, resulting in a high-quality ruthenium-containing film.

Career Highlights

Ashutosh has built an impressive career, having worked with major companies like Air Liquide America, L.P. and Air Liquide Electronics U.S. LP. His work in these organizations has enabled him to refine his expertise and contribute significantly to innovative projects in the electronics and materials sectors.

Collaborations

Throughout his career, Ashutosh has collaborated with talented professionals such as Matthew L. Fisher and Ravi Kumar Laxman. These collaborations have further enhanced his innovative capabilities and allowed for the exchange of ideas that foster advancements in their respective fields.

Conclusion

Ashutosh Misra's contributions to innovation and technology, particularly through his patents in synthesis methods and semiconductor manufacturing, underline his dedication to advancing the industry. With a solid career foundation and meaningful collaborations, he remains a significant figure in the realm of scientific innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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