The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Jan. 20, 2011
Applicants:
Bin Xia, Plano, TX (US);
Ashutosh Misra, Plano, TX (US);
Inventors:
Bin Xia, Plano, TX (US);
Ashutosh Misra, Plano, TX (US);
Assignee:
Air Liquide Electronics U.S. LP, Dallas, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 1/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for forming a film on a substrate in a semiconductor manufacturing process. A reaction chamber a substrate in the chamber are provided. A ruthenium based precursor, which includes ruthenium tetroxide dissolved in a mixture of at least two non-flammable fluorinated solvents, is provided and a ruthenium containing film is produced on the substrate.