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For the Inventor, By the Inventor

Dresden, Germany

Arthur Hotzel

USPTO Granted Patents = 13

Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:

goldMedal11 out of 5,671 
 
Globalfoundries Inc.
 patents
silverMedal2 out of 1,016 
 
Globalfoundries Singapore Pte. Ltd.
 patents

Years Active: 2013-2018

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):
1. 10161915 - In-situ contactless monitoring of photomask pellicle degradation (2018-12-25),
2. 9798244 - Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformity (2017-10-24),
3. 9798238 - Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques (2017-10-24),
4. 9653367 - Methods including a processing of wafers and spin coating tool (2017-05-16),
5. 9341961 - Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques (2016-05-17),
6. 9091943 - Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods (2015-07-28),
7. 9075934 - Reticle defect correction by second exposure (2015-07-07),
8. 9005882 - Reticle defect correction by second exposure (2015-04-14),
9. 8785112 - Reticle defect correction by second exposure (2014-07-22),
10. 8681310 - Mechanical fixture of pellicle to lithographic photomask (2014-03-25),
11. 8574795 - Lithographic CD correction by second exposure (2013-11-05),
12. 8551677 - Lithographic CD correction by second exposure (2013-10-08),
13. 8518189 - Vapor clean for haze and particle removal from lithographic photomasks (2013-08-27),

Title: Arthur Hotzel: Innovator in Photomask Technology

Introduction

Arthur Hotzel is a distinguished inventor based in Dresden, Germany. He has made significant contributions to the field of photomask technology, holding a total of 13 patents. His innovative work focuses on methods and apparatuses that enhance the monitoring and optimization of photomask pellicles.

Latest Patents

One of Hotzel's latest patents is titled "In-situ contactless monitoring of photomask pellicle degradation." This invention provides a method for detecting changes in the vibrational mode spectra and elasticity of a pellicle without relying on visual inspection. The process involves directing light onto the pellicle, causing deflection, and detecting the reflected light to characterize the vibrational mode of the pellicle.

Another notable patent is related to "Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques." This patent outlines methods for reducing reticle transmission differences and optimizing layer placement for overlay in MTRs and CTRs. The invention includes providing a reticle with a prime area and a frame area, determining RT differences, and implementing RT adjustment structures to decrease these differences.

Career Highlights

Arthur Hotzel has worked with prominent companies in the semiconductor industry, including GlobalFoundries Inc. and GlobalFoundries Singapore Pte. Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in photomask technology.

Collaborations

Throughout his career, Hotzel has collaborated with notable colleagues such as Remi Riviere and Guo Xiang Ning. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Arthur Hotzel is a key figure in the field of photomask technology, with a strong portfolio of patents that demonstrate his innovative spirit. His work continues to influence the semiconductor industry and improve the efficiency of photomask production processes.

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