The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Mar. 13, 2013
Arthur Hotzel, Dresden, DE;
Arthur Hotzel, Dresden, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Correction of reticle defects, including reticle weak spots or shortcomings, is accomplished with a second exposure. Embodiments include obtaining a reticle with a pattern corresponding to a wafer pattern design, exposing a wafer with the reticle, modifying the design, designating variations between the design and the modified design as reticle defects, and exposing the wafer with correction patterns containing structure corresponding to the modified design at defect positions. Other embodiments include modifying, eliminating, and/or shifting the pattern near a reticle blank defect position, and exposing a wafer with the reticle and with a correction pattern containing structure corresponding to the design at a defect position; modifying a patterned reticle surface layer near a defect forming an expanded defect, exposing a wafer with the modified reticle and with an expanded defect correction pattern; and exposing a wafer with a reticle and with a correction pattern larger than a detected reticle defect.