Veldhoven, Netherlands

Antonius Johannes De Kort


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2008-2010

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4 patents (USPTO):Explore Patents

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Title: Innovator Spotlight - Antonius Johannes De Kort

Introduction:

Antonius Johannes De Kort is a notable inventor based in Veldhoven, Netherlands, recognized for his contributions to the field of lithographic apparatus technologies. With an impressive portfolio of four patents, De Kort has made significant advancements in the calibration and software upgrades of lithographic devices.

Latest Patents:

De Kort's recent patents include innovative solutions in the realm of lithographic apparatus. His inventions focus on methods to mitigate thermal distortion effects on position measurements of the substrate table, calibration techniques using various scan trajectories, and software upgrades for pattern transfer onto substrates with precise control and timing.

Career Highlights:

Antonius Johannes De Kort is affiliated with ASML Netherlands B.V., a leading company in the semiconductor equipment industry. His expertise and dedication have played a crucial role in the development of cutting-edge lithographic systems that are essential for the manufacturing of integrated circuits and microchips.

Collaborations:

Throughout his career, De Kort has collaborated with esteemed colleagues such as Koen Jacobus Johannes Maria Zaal and Frederik Eduard De Jong. Together, they have synergized their expertise to drive innovation and push the boundaries of lithographic technology.

Conclusion:

In conclusion, Antonius Johannes De Kort stands out as a pioneering inventor in the field of lithographic apparatus, with a keen focus on precision, efficiency, and technological advancements. His patents and collaborations reflect his commitment to excellence and his invaluable contributions to the industry.

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