The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2008

Filed:

Sep. 12, 2005
Applicants:

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Antonius Johannes DE Kort, Veldhoven, NL;

Frederik Eduard DE Jong, Eindhoven, NL;

Koen Goorman, Eindhoven, NL;

Boris Menchtchikov, Eindhoven, NL;

Hermen Folken Pen, Veldhoven, NL;

Inventors:

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Antonius Johannes De Kort, Veldhoven, NL;

Frederik Eduard De Jong, Eindhoven, NL;

Koen Goorman, Eindhoven, NL;

Boris Menchtchikov, Eindhoven, NL;

Hermen Folken Pen, Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.


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