The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Jul. 28, 2006
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Antonius Johannes DE Kort, Veldhoven, NL;
Franciscus Van DE Mast, Eindhoven, NL;
Marteijn DE Jong, Wintelre, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Antonius Johannes De Kort, Veldhoven, NL;
Franciscus Van De Mast, Eindhoven, NL;
Marteijn De Jong, Wintelre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.