Asml Netherlands B.v.

Antonius Johannes De Kort

Koen Jacobus Johannes Maria Zaal

Boris Menchtchikov

Frederik Eduard De Jong

Koen Goorman

Hermen Folken Pen

Joost Jeroen Ottens

Andre Bernardus Jeunink

Franciscus Van De Mast

Judocus Marie Dominicus Stoeldraijer

Marteijn De Jong

A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.

Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method

The present invention relates to the activation of a software upgrade in a lithographic apparatus that transfers a pattern onto a substrate. The time and date of the activation of a software upgrade is compared with the time and date of the exposure of the first layer of a substrate or of a 'lot' of substrates. If the activation date and time is later than the first exposure date and time, software-functionality types is not mixed on a single lot or substrate and the old software-functionality is used for that lot or substrate. If, on the other hand, the activation date and time of the software-functionality update is earlier than the first exposure of the lot or substrate, the lot or substrate has not yet been affected by the old software-functionality and the new, updated software-functionality may be used to control the pattern transfer onto all of the substrate layers.

Software upgrades in a lithographic apparatus

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.

Method of calibrating a lithographic apparatus and device manufacturing method

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.

Lithographic method

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Veldhoven, Netherlands

Antonius Johannes De Kort