Anthony David Lisi

Title: Innovations of Anthony David Lisi

Introduction

Anthony David Lisi is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of interconnect structures for VLSI and ULSI devices. With a total of 11 patents to his name, Lisi's work has had a profound impact on the industry.

Latest Patents

Lisi's latest patents include innovative methods for the fabrication of air gap-containing interconnect structures. These methods utilize a photo-patternable low k material to produce highly reliable interconnect structures without the need for an etch step. The first patent focuses on methods for producing air gap-containing metal-insulator interconnect structures, where air gaps are defined by photolithography. The second patent also emphasizes the integration of air gaps of varying depths, further enhancing the reliability of the interconnect structures.

Career Highlights

Throughout his career, Lisi has worked with prominent companies such as IBM and Samsung Electronics Co., Ltd. His experience in these leading organizations has allowed him to refine his expertise in semiconductor technologies and contribute to groundbreaking innovations.

Collaborations

Lisi has collaborated with notable professionals in his field, including Lawrence Alfred Clevenger and Maxime Darnon. These collaborations have fostered an environment of innovation and have led to the development of advanced technologies in semiconductor manufacturing.

Conclusion

Anthony David Lisi's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a significant inventor. His innovative methods for air gap integration continue to influence the industry and pave the way for future advancements.