The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Jan. 14, 2010
Mukta G. Farooq, Hopewell Junction, NY (US);
Ramona Kei, Miami, FL (US);
Emily R. Kinser, Hopewell Junction, NY (US);
Anthony D. Lisi, Hopewell Junction, NY (US);
Richard Wise, Hopewell Junction, NY (US);
Hakeem Yusuff, Hopewell Junction, NY (US);
Mukta G. Farooq, Hopewell Junction, NY (US);
Ramona Kei, Miami, FL (US);
Emily R. Kinser, Hopewell Junction, NY (US);
Anthony D. Lisi, Hopewell Junction, NY (US);
Richard Wise, Hopewell Junction, NY (US);
Hakeem Yusuff, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is disclosed which includes patterning a photoresist layer on a substrate of a structure, removing a first portion of the photoresist layer to expose a first area of the substrate, etching the first area to form a cavity having a first depth, removing a second portion of the photoresist to expose an additional area of the substrate, and etching the cavity to expose a first conductor in the structure and the additional area to expose a second conductor in the structure.