Zoetermeer, Netherlands

Annemieke Van De Runstraat

This inventor holds 2 USPTO granted patents and 4 published patent applications and 2 EPO patents. Top assignees: Asml Netherlands B.v., Carl Zeiss Smt Gmbh, Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno. Active years: 2011-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Annemieke Van De Runstraat. Retrieved from https://idiyas.com/inventor/annemieke-van-de-runstraat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011-2014

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2 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Annemieke Van De Runstraat:

Title: The Innovative Work of Annemieke Van De Runstraat in Multi-Phase Reactions and EUV Lithography

Introduction:

Annemieke Van De Runstraat is a talented inventor based in Zoetermeer, NL, with a remarkable track record in the field of multi-phase reactions and EUV lithography. With a total of 2 patents to his name, Van De Runstraat is known for his pioneering work in developing novel processes and apparatus for carrying out complex reactions.

Latest Patents:

One of his latest patents includes a groundbreaking invention for a process and apparatus for conducting multi-phase reactions. This innovation involves utilizing Dean vortices generated by liquid flowing through a channel with multiple curvatures, resulting in efficient and controlled reactions with reaction mixtures comprising different physical phases.

Another notable patent by Van De Runstraat is focused on an optical arrangement for EUV lithography devices. This invention features optical elements designed to operate at high temperatures, thereby optimizing their reflective properties for soft X-ray- or EUV wavelength ranges. The methods developed by Van De Runstraat for cleaning and maintaining optical elements further demonstrate his expertise in this advanced technology.

Career Highlights:

Throughout his career, Annemieke Van De Runstraat has made significant contributions to the fields of chemistry and photonics. He has garnered experience working with renowned companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V., where his innovative ideas have been instrumental in shaping cutting-edge technologies for industrial applications.

Collaborations:

Van De Runstraat has collaborated with esteemed professionals in the industry, including Dirk Heinrich Ehm and Bastiaan Theodoor Wolschrijn. Together, they have pushed the boundaries of innovation in multi-phase reactions and EUV lithography, paving the way for new advancements in these fields.

Conclusion:

In conclusion, Annemieke Van De Runstraat stands out as a visionary inventor with a passion for developing groundbreaking solutions in multi-phase reactions and EUV lithography. His valuable patents and collaborations underscore his commitment to driving innovation and pushing the boundaries of technological advancement in diverse industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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