Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Annemieke Van De Runstraat

Johannes Hubertus Josephina Moors

Michel Riepen

Dirk Heinrich Ehm

Bastiaan Theodoor Wolschrijn

Earl Lawrence Vincent Goetheer

Norbertus Benedictus Koster

Cornelis Petrus Marcus Roelands

Thomas Stein

Johannes Van Der Meer

Leonard Ferdinand Gerard Geers

Michiel Nienoord

Peter Geerdink

Arnoldus Jan Storm

Esther L J Van Soest-Vercammen

Frits G H M Gubbels

Peter J Oprel

Marco G H Meijerink

A G Ton M Bastein

Lucie Prins

Lauran Kwakernaat

The invention is directed to a process and apparatus for carrying out reactions with reaction mixtures comprising different physical phases. In a first aspect, the present invention is directed to a process for carrying out chemical reactions comprising a step wherein a reaction mixture comprising at least two different physical phases, wherein at least one of these phases being liquid, is subjected to the action of Dean vortices, which Dean vortices result from said liquid flowing through a channel having at least two curvatures, wherein the channel comprises for at least a fraction of its total length a smooth inner surface.

Process and apparatus for carrying out multi-phase reactions

An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30&#xb0; C. or more, preferably of approximately 100&#xb0; C. or more, particularly preferably of approximately 150&#xb0; C. or more, and even more preferably of approximately 250&#xb0; C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.

Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

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Zoetermeer, Netherlands

Annemieke Van De Runstraat