The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Sep. 13, 2007
Dirk Heinrich Ehm, Aalen, DE;
Annemieke Van DE Runstraat, Zoetermeer, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Arnoldus Jan Storm, Delft, NL;
Thomas Stein, Oberkocken, DE;
Marco G. H. Meijerink, The Hague, NL;
A. G. Ton M. Bastein, Leiden, NL;
Esther L. J. Van Soest-vercammen, Soesterberg, NL;
Norbertus Benedictus Koster, Delft, NL;
Frits G. H. M. Gubbels, Helmond, NL;
Peter J. Oprel, Delft, NL;
Michiel Nienoord, Apeldoorn, NL;
Michel Riepen, Delft, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Dirk Heinrich Ehm, Aalen, DE;
Annemieke Van De Runstraat, Zoetermeer, NL;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Arnoldus Jan Storm, Delft, NL;
Thomas Stein, Oberkocken, DE;
Marco G. H. Meijerink, The Hague, NL;
A. G. Ton M. Bastein, Leiden, NL;
Esther L. J. Van Soest-Vercammen, Soesterberg, NL;
Norbertus Benedictus Koster, Delft, NL;
Frits G. H. M. Gubbels, Helmond, NL;
Peter J. Oprel, Delft, NL;
Michiel Nienoord, Apeldoorn, NL;
Michel Riepen, Delft, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.