Singapore, Singapore

Anjam Khursheed

USPTO Granted Patents = 14 

Average Co-Inventor Count = 1.3

ph-index = 5

Forward Citations = 139(Granted Patents)


Location History:

  • Kent Vale, SG (2005)
  • Chuville, SG (2007 - 2008)
  • Singapore, SG (2000 - 2021)

Company Filing History:


Years Active: 2000-2021

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14 patents (USPTO):Explore Patents

Title: The Innovations of Anjam Khursheed: Pioneering Patented Technologies in Singapore

Introduction

Anjam Khursheed is a prominent inventor based in Singapore, known for his significant contributions to the field of electron emission technologies. With 14 patents to his name, his work focuses on advancing methodologies and apparatus that enhance the capabilities of electron microscopy and lithography applications. His innovative spirit and dedication to research have positioned him as a key figure in modern scientific advancements.

Latest Patents

Among his latest patents, two stand out for their groundbreaking nature. The first is a "Cathode structure for cold field electron emission and method of fabricating the same." This invention involves a unique cathode structure featuring a pointed cathode wire and a graphene-based coating at the wire's tip. The use of nickel tips coated with graphene through chemical vapor deposition allows for stable cold field emission with an ultralow work function value of about 1.1 eV. This advancement holds significant potential for applications in electron microscopy and lithography.

The second noteworthy patent is the "Aberration correction apparatus, device having the same, and method for correcting aberration of charged particles." This apparatus includes an aberration correction unit designed to propagate an annular beam of charged particles while generating opposing magnetic and electric fields. This innovation is pivotal for altering the trajectories of charged particles, thereby improving the precision and effectiveness of charged particle applications.

Career Highlights

Anjam has collaborated with prestigious institutions throughout his career, notably the National University of Singapore and the Institute of Materials Research and Engineering. His roles in these organizations have played a crucial part in the development of his patented technologies, enabling him to work on cutting-edge research projects that push the boundaries of his field.

Collaborations

Throughout his career, Anjam has worked alongside talented individuals, including Hung Quang Hoang and Jacob C Phang. Their collaborations have fostered an environment of innovation and creativity, leading to the successful development of several patents that contribute to advancements in electron emission technologies.

Conclusion

Anjam Khursheed's innovative contributions to the field of electron emission exemplify the impact of dedicated research and development in the technological landscape. His latest patents reflect a deep understanding of materials science and engineering, as well as a commitment to enhancing practical applications in microscopy and lithography. As he continues to push the boundaries of innovation, his work will undoubtedly inspire future inventors and researchers in the field.

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