The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
May. 21, 2014
Applicant:
National University of Singapore, Singapore, SG;
Inventor:
Anjam Khursheed, Singapore, SG;
Assignee:
NATIONAL UNIVERSITY OF SINGAPORE, Singapore, SG;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 3/18 (2006.01); H01J 3/20 (2006.01); H01J 3/02 (2006.01);
U.S. Cl.
CPC ...
H01J 3/18 (2013.01); H01J 3/021 (2013.01); H01J 3/027 (2013.01); H01J 3/20 (2013.01); H01J 37/26 (2013.01);
Abstract
A gun configured to generate charged particles, comprising a ring-cathode () electrically configured to generate a charged particle beam; a lens arranged to focus the charged particle beam on a specimen; and at least one correction focusing electrode () arranged to generate at least one electrostatic/magnetic field to further divergently/convergently focus the charged particle beam for correcting in-plane geometric aberrations associated with the lens, the focusing being based on the in-plane geometric aberrations associated with the lens. A related method is also disclosed.