The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Nov. 16, 2012
National University of Singapore, Singapore, SG;
Anjam Khursheed, Singapore, SG;
Hung Quang Hoang, Singapore, SG;
National University of Singapore, Singapore, SG;
Abstract
A sequential radial mirror analyzer (RMA) () for facilitating rotationally symmetric detection of charged particles caused by a charged beam incident on a specimen () is disclosed. The RMA comprises a 0V equipotential exit grid (), and a plurality of electrodes () electrically configured to generate corresponding electrostatic fields for deflecting at least some of the charged particles of a single energy level to exit through the exit grid () to form a second-order focal point on a detector (). The second-order focal point is associated with the single energy level, and the detector () is disposed external to the corresponding electrostatic fields. A related method is also disclosed.