Company Filing History:
4 out of 153 
3 out of 600 
2 out of 8 Years Active: 2008-2017
Title: The Innovative Contributions of Andrzej Buczkowski
Introduction
Andrzej Buczkowski is a notable inventor based in Bend, Oregon, who has made significant contributions to the field of optical metrology. With a total of seven patents to his name, Buczkowski's work focuses on advanced imaging systems that enhance the detection and analysis of light interactions with various samples.
Latest Patents
One of Buczkowski's latest patents is an optical metrology system designed for spectral imaging of a sample. This innovative device is capable of detecting any combination of photoluminescence light, specular reflection of broadband light, and scattered light from a line across the width of a sample. The metrology device includes a first light source that produces an illumination line on the sample. A scanning system is employed to scan an illumination spot across the sample, forming the illumination line. A detector collects the photoluminescence light emitted along this line. Additionally, a broadband illumination source may produce a second illumination line on the sample, allowing the detector to collect the broadband illumination reflected along this line. The system also features a signal collecting optic that focuses the collected light into a line, which is then received by an optical conduit that matches the entrance of the detector.
Career Highlights
Throughout his career, Buczkowski has worked with prominent companies in the industry, including Nanometrics Inc. and Sumco Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in optical metrology.
Collaborations
Buczkowski has collaborated with several talented individuals in his field, including Benno Orschel and Joel Kearns. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Andrzej Buczkowski's contributions to optical metrology through his innovative patents and collaborations highlight his significant role in advancing the field. His work continues to influence the way light interactions are analyzed and understood in various applications.