The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2009

Filed:

Nov. 16, 2006
Applicants:

Benno Orschel, Saga, JP;

Andrzej Buczkowski, Bend, OR (US);

Fritz Kirscht, Berlin, DE;

Inventors:

Benno Orschel, Saga, JP;

Andrzej Buczkowski, Bend, OR (US);

Fritz Kirscht, Berlin, DE;

Assignee:

Sumco Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2006.01); G01R 31/00 (2006.01); G01R 21/47 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of determining a diffusion length of a minority carrier in a material which includes applying a first excitation light having a first photon flux to a material, measuring a first surface photo voltage resulting from the application of the first excitation light, applying a second excitation light having a second photon flux to the material, measuring a second surface photo voltage resulting from the application of the second excitation light, applying a third excitation light having a third photon flux, having a predetermined ratio to the first photon flux, to the material, measuring a third surface photo voltage resulting from the application of the third excitation light, determining a diffusion length of a minority carrier in the material based on the measured first, second and third surface photo voltages.


Find Patent Forward Citations

Loading…