Andrew Nolan

Title: Andrew Nolan: Innovator in Surface Modification Technologies

Introduction

Andrew Nolan is a prominent inventor based in Albany, NY (US). He has made significant contributions to the field of surface modification, holding a total of 5 patents. His innovative methods and systems have advanced the technology used in various applications.

Latest Patents

One of Andrew's latest patents focuses on a surface modification process. This method describes techniques for etching that involve providing a substrate with a device structure, where specific portions are identified for modification. The process includes passivating target surfaces by exposing the device structure to a gas-phase composition at a processing pressure of 100 mTorr or greater, forming a protective layer on the target surfaces. Another notable patent involves methods of surface restoration for nitride etching. This method enhances etch selectivity for nitride etching by modifying the surface of a substrate with a nitride-containing structure, which has an oxygen-nitrogen layer. The process generates a cleaned nitride-containing structure, enabling effective nitride etch processes that meet target etch rates and selectivity.

Career Highlights

Andrew Nolan is currently employed at Tokyo Electron Limited, where he continues to develop innovative technologies. His work has been instrumental in advancing surface modification techniques that are crucial for modern semiconductor manufacturing.

Collaborations

Andrew collaborates with talented professionals in his field, including Alok Ranjan and Christopher Talone. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Andrew Nolan is a key figure in the realm of surface modification technologies, with a strong portfolio of patents that reflect his innovative spirit. His contributions are shaping the future of semiconductor manufacturing and related fields.