This inventor holds 3 USPTO granted patents. Top assignee: Rohm and Haas Electronic Materials Cmp Holdings, Inc.. Active years: 2011-2015.
Company Filing History:
Years Active: 2011-2015
Title: Andrew M. Geiger: Innovator in Chemical Mechanical Polishing Technologies
Introduction
Andrew M. Geiger is a notable inventor based in Newark, DE (US), recognized for his contributions to the field of chemical mechanical polishing. With a total of 3 patents to his name, Geiger has made significant advancements that enhance the efficiency and effectiveness of polishing processes in various applications.
Latest Patents
Geiger's latest patents include innovative methods and assemblies that address common challenges in the industry. One of his notable inventions is a method for chemical mechanical polishing layer pretexturing. This method involves providing a chemical mechanical polishing layer with a polishing surface, utilizing a belt sanding machine to feed the layer through a gap between a transport belt and a calibrating sanding belt. This process ensures that the polishing surface comes into contact with the calibrating sanding belt, effectively reducing the thickness of the polishing layer.
Another significant patent is the mix head assembly for forming chemical mechanical polishing pads. This assembly is designed to minimize inclusions of entrained gas inclusion defects during the manufacturing process of polishing pad polishing layers, thereby improving the quality and performance of the final product.
Career Highlights
Geiger is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc., where he continues to develop innovative solutions in the field of chemical mechanical polishing. His work has been instrumental in advancing the technology used in this critical area of materials processing.
Collaborations
Throughout his career, Geiger has collaborated with several talented individuals, including coworkers John Esbenshade and Paul Libbers. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Andrew M. Geiger's contributions to the field of chemical mechanical polishing are noteworthy, with his innovative patents paving the way for advancements in the industry. His work continues to influence the development of more efficient polishing processes, showcasing his commitment to innovation and excellence.