Rohm and Haas Electronic Materials Cmp Holdings, Inc.

Andrew M Geiger

Samuel J November

Paul J Sacchetti

Michael E Watkins

John Esbenshade

David Verbaro

Paul Libbers

Jonathan Tracy

John Henry Nunley, Jr

Jeffrey Benedict

A method for pretexturing the polishing surface of a chemical mechanical polishing layer, comprising providing a chemical mechanical polishing layer having a polishing surface; providing a belt sanding machine; feeding the chemical mechanical polishing layer through a gap between a transport belt and a calibrating sanding belt of the belt sanding machine; and, wherein the polishing surface comes into contact with the calibrating sanding belt; wherein the thickness of the polishing layer is reduced.

Method for chemical mechanical polishing layer pretexturing

A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.

Mix head assembly for forming chemical mechanical polishing pads

A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.

Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects

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Newark, DE, United States of America

Andrew M Geiger