The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Jun. 23, 2009
John Esbenshade, Clayton, DE (US);
Andrew M Geiger, Newark, DE (US);
Paul Libbers, Claymont, DE (US);
Samuel J November, Newtown, PA (US);
Paul J Sacchetti, Warrington, PA (US);
Jonathan Tracy, Kennett Square, PA (US);
David Verbaro, Cinnaminson, NJ (US);
Michael E Watkins, Bear, DE (US);
John Esbenshade, Clayton, DE (US);
Andrew M Geiger, Newark, DE (US);
Paul Libbers, Claymont, DE (US);
Samuel J November, Newtown, PA (US);
Paul J Sacchetti, Warrington, PA (US);
Jonathan Tracy, Kennett Square, PA (US);
David Verbaro, Cinnaminson, NJ (US);
Michael E Watkins, Bear, DE (US);
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Abstract
A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.