Anger, Germany

Andreas Frommhold

USPTO Granted Patents = 11 

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Am Hermsdorfer Anger, DE (2016)
  • Anger, DE (2015 - 2019)
  • Dera, DE (2018 - 2022)
  • Gera, DE (2017 - 2023)

Company Filing History:


Years Active: 2015-2023

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11 patents (USPTO):Explore Patents

Title: Innovations by Andreas Frommhold

Introduction

Andreas Frommhold is a notable inventor based in Anger, Germany. He has made significant contributions to the field of photoresist materials, holding a total of 11 patents. His work focuses on enhancing the performance of photoresist compositions used in advanced lithography processes.

Latest Patents

Among his latest patents is the development of enhanced EUV photoresist materials, formulations, and processes. This patent discloses a novel negative-type photoresist composition and methods of their use. It further relates to multiple trigger photoresist processes that improve contrast, resolution, and line edge roughness without sacrificing sensitivity. The compositions and methods are ideal for fine pattern processing using various radiation types, including ultraviolet and extreme ultraviolet radiation. Another significant patent involves multiple trigger monomer containing photoresist compositions and processes. This innovation enhances the chemical gradient in areas receiving low doses of irradiation, effectively improving resolution and exposure latitude.

Career Highlights

Throughout his career, Andreas has worked with Irresistible Materials, Ltd, where he has contributed to the advancement of photoresist technologies. His expertise in this area has positioned him as a key figure in the development of innovative materials for the semiconductor industry.

Collaborations

Andreas has collaborated with notable professionals in his field, including Dongxu Yang and John L Roth. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in photoresist technology.

Conclusion

Andreas Frommhold's contributions to the field of photoresist materials and processes have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing technology in this critical area.

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