The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2023
Filed:
Feb. 25, 2019
Alex P. G. Robinson, Birmingham, GB;
Carmen Popescu, Birmingham, GB;
John Roth, Cohasset, MA (US);
Andreas Frommhold, Gera, DE;
Edward Jackson, Franklin, MA (US);
Alexandra Mcclelland, Worcester, GB;
Tom Lada, Somerville, MA (US);
Greg O'callahan, Birmingham, GB;
Alex P. G. Robinson, Birmingham, GB;
Carmen Popescu, Birmingham, GB;
John Roth, Cohasset, MA (US);
Andreas Frommhold, Gera, DE;
Edward Jackson, Franklin, MA (US);
Alexandra McClelland, Worcester, GB;
Tom Lada, Somerville, MA (US);
Greg O'Callahan, Birmingham, GB;
Other;
Abstract
The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.