This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignees: Irresistible Materials, Ltd, Other. Active years: 2019-2023.
Company Filing History:
1 out of 10 
1 out of 834,307 Years Active: 2019-2023
Title: Tom Lada: Innovator in Photoresist Technologies
Introduction
Tom Lada is a notable inventor based in Somerville, MA (US), recognized for his contributions to the field of photoresist materials. With a total of 2 patents, Lada has made significant advancements in the development of materials and processes that enhance the capabilities of photoresist technologies.
Latest Patents
Lada's latest patents include "Enhanced EUV Photoresist Materials, Formulations and Processes" and "Spin on Hard Mask Material." The first patent focuses on a novel negative-type photoresist composition and methods of their use. This disclosure relates to multiple trigger photoresist processes that improve contrast, resolution, and line edge roughness without sacrificing sensitivity. The compositions and methods are ideal for fine pattern processing using various radiation types, including ultraviolet and extreme ultraviolet radiation. The second patent presents a composition for forming a spin-on hard mask, which includes a fullerene derivative and a crosslinking agent, along with a process for creating a hard mask.
Career Highlights
Throughout his career, Tom Lada has worked with various companies, including Irresistible Materials Ltd. His innovative work in photoresist technologies has positioned him as a key figure in the industry.
Collaborations
Lada has collaborated with notable individuals such as Alex P G Robinson and Carmen Popescu, contributing to the advancement of photoresist materials and processes.
Conclusion
Tom Lada's contributions to the field of photoresist technologies through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.