Worcestershire, United Kingdom

Alexandra McClelland

USPTO Granted Patents = 5 

Average Co-Inventor Count = 6.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Worcestershire, GB (2018 - 2022)
  • Worcester, GB (2016 - 2023)

Company Filing History:


Years Active: 2016-2023

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5 patents (USPTO):Explore Patents

Title: Innovations by Alexandra McClelland

Introduction

Alexandra McClelland is a prominent inventor based in Worcestershire, GB. She has made significant contributions to the field of photoresist materials, with a focus on enhancing the performance of these materials in various applications. With a total of 5 patents to her name, her work is recognized for its innovative approaches and technical advancements.

Latest Patents

One of her latest patents is titled "Enhanced EUV photoresist materials, formulations and processes." This patent relates to novel negative-type photoresist compositions and methods that improve contrast, resolution, and line edge roughness without sacrificing sensitivity. The compositions are designed for fine pattern processing using various radiation types, including ultraviolet and extreme ultraviolet radiation. Another significant patent is "Multiple trigger monomer containing photoresist compositions and method." This invention involves a unique process that enhances the chemical gradient in areas receiving low doses of irradiation, thereby improving resolution and exposure latitude.

Career Highlights

Throughout her career, Alexandra has worked with Irresistible Materials, Ltd, where she has applied her expertise in developing advanced photoresist technologies. Her innovative work has positioned her as a key figure in the field, contributing to the advancement of materials used in high-precision applications.

Collaborations

Alexandra has collaborated with notable professionals in her field, including Andreas Frommhold and Dongxu Yang. These collaborations have further enriched her research and development efforts, leading to groundbreaking advancements in photoresist technology.

Conclusion

Alexandra McClelland's contributions to the field of photoresist materials demonstrate her innovative spirit and commitment to advancing technology. Her patents reflect a deep understanding of the complexities involved in material science, making her a valuable asset to the industry.

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