The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Feb. 24, 2014
Alex Philip Graham Robinson, Birmingham, GB;
Jon Andrew Preece, Birmingham, GB;
Richard Edward Palmer, Southbridge, GB;
Andreas Frommhold, Anger, DE;
Dongxu Yang, Birmingham, GB;
Alexandra Mcclelland, Worcester, GB;
Drew Athans, Dover, NH (US);
Xiang Xue, Winchester, MA (US);
Alex Philip Graham Robinson, Birmingham, GB;
Jon Andrew Preece, Birmingham, GB;
Richard Edward Palmer, Southbridge, GB;
Andreas Frommhold, Anger, DE;
Dongxu Yang, Birmingham, GB;
Alexandra McClelland, Worcester, GB;
Drew Athans, Dover, NH (US);
Xiang Xue, Winchester, MA (US);
IRRESISTIBLE MATERIALS LTD, Swansea, Wales, GB;
Abstract
The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.