Birmingham, United Kingdom

Dongxu Yang


Average Co-Inventor Count = 6.2

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Selly Oak Birmingham, GB (2015 - 2016)
  • Birmingham, GB (2016 - 2017)
  • Sichuan, CN (2018 - 2022)

Company Filing History:


Years Active: 2015-2022

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8 patents (USPTO):Explore Patents

Title: Dongxu Yang: Innovator in Photoresist Compositions

Introduction

Dongxu Yang is a prominent inventor based in Birmingham, GB. He has made significant contributions to the field of photoresist compositions, holding a total of 8 patents. His innovative work focuses on enhancing the resolution and exposure latitude in fine pattern processing.

Latest Patents

Yang's latest patents include groundbreaking developments in multiple trigger monomer containing photoresist compositions and methods. These patents describe novel negative working photoresist compositions that involve a two-step process. The first step entails removing acid-labile protecting groups from crosslinking functionalities, while the second step involves crosslinking these functionalities with an acid-sensitive crosslinker. This innovative approach increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built-in dose-dependent quencher-analog. As a result, it enhances the chemical gradient, resolution, resolution blur, and exposure latitude. The photoresist compositions are ideal for fine pattern processing using various radiation types, including ultraviolet radiation, extreme ultraviolet radiation, X-rays, and charged particle rays.

Career Highlights

Throughout his career, Dongxu Yang has worked with Irresistible Materials, Ltd, where he has further developed his expertise in photoresist technologies. His contributions have been instrumental in advancing the capabilities of photoresist compositions in the industry.

Collaborations

Yang has collaborated with notable professionals in his field, including Andreas Frommhold and John L Roth. These collaborations have enriched his work and contributed to the development of innovative solutions in photoresist technology.

Conclusion

Dongxu Yang's contributions to the field of photoresist compositions demonstrate his commitment to innovation and excellence. His patents and collaborative efforts continue to influence advancements in fine pattern processing technologies.

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