The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Oct. 16, 2014
Alex Philip Graham Robinson, Birmingham, GB;
Andreas Frommhold, Am Hermsdorfer Anger, DE;
Alan G. Brown, Malvern, GB;
Thomas Lada, Somerville, MA (US);
Alex Philip Graham Robinson, Birmingham, GB;
Andreas Frommhold, Am Hermsdorfer Anger, DE;
Alan G. Brown, Malvern, GB;
Thomas Lada, Somerville, MA (US);
IRRESISTIBLE MATERIALS LTD, Swansea, Wiles, GB;
Abstract
The present disclosure relates to novel two-step photoresist compositions and processes. The processes involve removing acid-labile groups in step one and crosslinking the remaining material with themselves or added crosslinking systems in step two. The incorporation of a multistep pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Dual functionality photosensitive compositions and methods are also disclosed.