Täby, Sweden

Anders Thuren

This inventor holds 3 USPTO granted patents. Top assignee: Micronic Laser Systems Ab. Active years: 1997-2005.


% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 3

Forward Citations = 111(Granted Patents)


Company Filing History:


Years Active: 1997-2005

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3 patents (USPTO):Explore Patents

Title: Innovations of Anders Thuren in Lithography

Introduction

Anders Thuren is a notable inventor based in Täby, Sweden. He has made significant contributions to the field of lithography, particularly in methods that enhance precision and reduce errors in the manufacturing process. With a total of 3 patents to his name, Thuren's work is pivotal in advancing technologies used in semiconductor and display panel production.

Latest Patents

Thuren's latest patents include a method for error reduction in lithography. This invention relates to a system for predicting and correcting geometrical errors in lithography using masks and exposure stations. The method involves collecting information about various components, predicting distortions in the pattern, and applying corrections during the exposure process. Another significant patent is for a laser writer system, which provides high precision printing of patterns on photosensitive substrates. This method includes detecting temporary writing errors and allows for the writing process to be interrupted and resumed seamlessly.

Career Highlights

Anders Thuren is associated with Micronic Laser Systems AB, a company known for its innovative solutions in the field of laser lithography. His work has contributed to the development of advanced technologies that are essential for the production of high-quality semiconductor devices and display panels.

Collaborations

Thuren has collaborated with notable colleagues such as Torbjorn E Sandstrom and Stefan Gullstrand. These collaborations have further enhanced the impact of his inventions in the industry.

Conclusion

Anders Thuren's contributions to lithography through his innovative patents and collaborations have significantly advanced the field. His work continues to influence the manufacturing processes of semiconductor devices and display technologies.

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