Micronic Laser Systems Ab

Anders Thuren

Torbjorn E Sandstrom

Per Askebjer

Peter Ekberg

Mats Ekberg

Leif Odselius

Stefan Gullstrand

Torjborn Sandstrom

The present invention relates to a method and a system for predicting and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, printing the pattern of said masks on a workpiece, such as a display panel or a semi-conductor wafer. The method according to the invention comprises the steps of collecting information about a mask substrate, a mask writer, an exposure stati n, and/or about behavior of a processing step that will occur after the writing of the mask. Further the method comprises predicting from the combined information distorsions occuring in the pattern, when it is subsequently printed on the workpiece; calculating from said prediction a correction to diminish said predicted distorsion, and exposing said pattern onto said mask substrate while applying said correction for said distorsions.

Method for error reduction in lithography

A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.

Laser writer

A system for writing geometric structures on a photosensitive substrate including a modulated laser beam source, a focusing lens, a deflector for producing a scanning action between the light source and the lens, and a device for mechanically moving the surface relative to the laser beam. Compressed data for use in writing the geometric structures is read out of a memory into a data delivery circuit such that the data is formatted to have both beam power and position information. A modulator logic circuit operates to call up the data from the data delivery circuit, form a modulation drive signal based on the power information, and delay the modulation drive signal based the position data. The modulator logic circuit thus operates to vary the modulation drive signal to begin or end exposure along the scan lines with greater resolution or pixel density by at least a factor of four more than the resolution or spacing density between adjacent scan lines. The scan lines are arranged within stripes, and adjacent stripes preferably are made to overlap such that the stripes are blended in the overlap according to a predetermined stepwise changing function.

Method and apparatus for the production of a structure by focused laser

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Taby, Sweden

Anders Thuren