The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2003

Filed:

Nov. 02, 2001
Applicant:
Inventors:

Torbjorn Sandstrom, Pixbo, SE;

Leif Odselius, Upplands Vasby, SE;

Anders Thuren, Taby, SE;

Stefan Gullstrand, Danderyd, SE;

Assignee:

Micronic Laser Systems AB, Täby, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G03B 2/774 ; G03B 2/772 ; B41J 2/435 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G03B 2/774 ; G03B 2/772 ; B41J 2/435 ;
Abstract

A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.


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