Amrita Singh

Title: Amrita Singh: Innovator in Semiconductor-Superconductor Hybrid Devices

Introduction

Amrita Singh is a notable inventor based in Delft, Netherlands. She has made significant contributions to the field of semiconductor-superconductor hybrid devices. With a total of 3 patents to her name, her work focuses on innovative methods of fabrication that enhance material deposition techniques.

Latest Patents

One of her latest patents is titled "Method of fabricating a hollow wall for controlling directional deposition of material." This method involves forming a layer of resist on a substrate and selectively removing a portion of the resist to create a channel. An amorphous dielectric material is then formed in the channel, and the resist is removed to create the hollow wall. This hollow wall is crucial for controlling material deposition during the fabrication of semiconductor-superconductor hybrid devices. By configuring the channel appropriately, bending of the hollow wall can be prevented, allowing for more precise material deposition. Additionally, she has developed a method of selectively patterning a device structure using a hollow shadow wall, which enhances the precision of device component fabrication.

Career Highlights

Amrita has worked with prominent organizations such as Microsoft Technology Licensing, LLC and Delft University of Technology. Her experience in these institutions has allowed her to refine her skills and contribute to cutting-edge research in her field.

Collaborations

Amrita has collaborated with talented individuals, including Senja Ramakers and Pavel Aseev. These partnerships have fostered innovation and have been instrumental in her research endeavors.

Conclusion

Amrita Singh's innovative work in the field of semiconductor-superconductor hybrid devices showcases her expertise and dedication to advancing technology. Her patents reflect her commitment to enhancing fabrication methods, making her a significant figure in her industry.