The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Dec. 05, 2019
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Pavel Aseev, Delft, NL;
Ekaterina Chernysheva, Delft, NL;
Amrita Singh, Delft, NL;
Guanzhong Wang, Delft, NL;
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Delft University of Technology, Delft, NL;
Abstract
A method of fabricating a hollow wall for controlling directional deposition of material comprises: forming a layer of resist on a substrate; removing a portion of the resist selectively to form a channel in the resist; forming a layer of an amorphous dielectric material in the channel; and removing the resist to form the hollow wall. The channel has a front surface configured to prevent bending of a corresponding front face of the hollow wall. The hollow wall is useful for controlling deposition of material when fabricating semiconductor-superconductor hybrid devices, for example. By configuring the channel appropriately, bending of the hollow wall can be prevented, allowing for more precise deposition of material. Also provided is a further method of fabricating a hollow wall; and a method of fabricating a device using the hollow walls.