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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Amit Khandelwal

This inventor holds 19 USPTO granted patents and 2 published patent applications, primarily in Tungsten Film Deposition. Top assignee: Applied Materials, Inc.. Active years: 2008-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Amit Khandelwal. Retrieved from https://idiyas.com/inventor/amit-khandelwal

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 36.8

Average Co-Inventor Count = 4.9

ph-index = 8

Forward Citations = 550(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2008 - 2013)
  • Cupertino, CA (US) (2011 - 2013)
  • San Jose, CA (US) (2014 - 2017)

Company Filing History:

goldMedal19 out of 14,544 
 
Applied Materials, Inc.
 patents

Years Active: 2008-2017

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Areas of Expertise:
Tungsten Film
Atomic Layer Deposition
Substrate Processing
Plasma Treatment
Film Roughness
Thermal Processing
Cobalt Silicide
Metal Fill
Barrier Layers
Vapor Deposition
Impurity Removal
Contact Metallization
19 patents (USPTO):Explore Patents
1. 9783889 - Apparatus for variable substrate temperature control (2017-10-10),
2. 9546419 - Method of reducing tungsten film roughness and resistivity (2017-01-17),
3. 9275865 - Plasma treatment of film for impurity removal (2016-03-01),
4. 8920564 - Methods and apparatus for thermal based substrate processing with variable temperature capability (2014-12-30),
5. 8563424 - Process for forming cobalt and cobalt silicide materials in tungsten contact applications (2013-10-22),
6. 8551880 - Ammonia-based plasma treatment for metal fill in narrow features (2013-10-08),
7. 8513116 - Atomic layer deposition of tungsten materials (2013-08-20),
8. 8211799 - Atomic layer deposition of tungsten materials (2012-07-03),
9. 8187970 - Process for forming cobalt and cobalt silicide materials in tungsten contact applications (2012-05-29),
10. 8071478 - Method of depositing tungsten film with reduced resistivity and improved surface morphology (2011-12-06),
11. 7964505 - Atomic layer deposition of tungsten materials (2011-06-21),
12. 7838441 - Deposition and densification process for titanium nitride barrier layers (2010-11-23),
13. 7745333 - Methods for depositing tungsten layers employing atomic layer deposition techniques (2010-06-29),
14. 7732327 - Vapor deposition of tungsten materials (2010-06-08),
15. 7691442 - Ruthenium or cobalt as an underlayer for tungsten film deposition (2010-04-06),

Title: Unveiling the Innovations of Amit Khandelwal

Introduction:

Amit Khandelwal, an inventive mind hailing from Santa Clara, CA, has made significant strides in the realm of technological advancements. With a portfolio boasting 19 patents to his name, Amit's contributions are reshaping the landscape of substrate temperature control and tungsten film applications.

Latest Patents:

One of Amit's latest patents showcases an innovative Apparatus for variable substrate temperature control. This apparatus incorporates a unique design including a movable heater, seal ring, spacer pins, and resilient element to precisely manage substrate temperatures. Another notable patent by Amit revolves around the method of reducing tungsten film roughness and resistivity, offering insights into controlling crystal size for enhanced performance.

Career Highlights:

Amit Khandelwal is an integral part of Applied Materials, Inc., a global leader in materials engineering solutions. His expertise and ingenuity have propelled the company's endeavors towards cutting-edge technological advancements, solidifying his position as a visionary in the industry.

Collaborations:

In his journey towards innovation, Amit has collaborated with esteemed professionals such as Avgerinos V Gelatos and Madhu Moorthy. Together, they have synergized their expertise to drive forward groundbreaking research and development initiatives, leaving a lasting impact on the field.

Conclusion:

In conclusion, Amit Khandelwal stands as a beacon of innovation, with his trailblazing patents and collaborative spirit shaping the future of technological advancements. His relentless pursuit of excellence and commitment to transformative inventions continue to inspire the next generation of inventors and researchers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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