The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2017

Filed:

Mar. 26, 2012
Applicants:

Gwo-chuan Tzu, Sunnyvale, CA (US);

Xiaoxiong Yuan, San Jose, CA (US);

Amit Khandelwal, San Jose, CA (US);

Avgerinos V. Gelatos, Redwood City, CA (US);

Olkan Cuvalci, Sunnyvale, CA (US);

Kai Wu, Palo Alto, CA (US);

Michael P. Karazim, San Jose, CA (US);

Inventors:

Gwo-Chuan Tzu, Sunnyvale, CA (US);

Xiaoxiong Yuan, San Jose, CA (US);

Amit Khandelwal, San Jose, CA (US);

Avgerinos V. Gelatos, Redwood City, CA (US);

Olkan Cuvalci, Sunnyvale, CA (US);

Kai Wu, Palo Alto, CA (US);

Michael P. Karazim, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/455 (2006.01); C23C 16/48 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/46 (2013.01); C23C 16/4583 (2013.01); C23C 16/4585 (2013.01); C23C 16/4586 (2013.01); C23C 16/45565 (2013.01); C23C 16/481 (2013.01); C23C 16/52 (2013.01);
Abstract

In some embodiments, an apparatus for variable substrate temperature control may include a heater moveable along a central axis of a substrate support; a seal ring disposed about the heater, the seal ring configured to interface with a shadow ring disposed above the heater to form a seal; a plurality of spacer pins configured to support a substrate and disposed within a plurality of through holes formed in the heater, the plurality of spacer pins moveable parallel to the central axis, wherein the plurality of spacer pins control a first distance between the substrate and the heater and a second distance between the substrate and the shadow ring; and a resilient element disposed beneath the seal ring to bias the seal ring toward a backside surface of the heater.


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