Sakai, Japan

Akira Okuda


Average Co-Inventor Count = 3.3

ph-index = 6

Forward Citations = 77(Granted Patents)


Location History:

  • Sakaishi, JP (1999)
  • Sakai, JP (1989 - 2002)

Company Filing History:


Years Active: 1989-2002

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8 patents (USPTO):Explore Patents

Title: Akira Okuda: Innovator in Thin Film Technology

Introduction

Akira Okuda is a prominent inventor based in Sakai, Japan, known for his contributions to thin film deposition technology. With a total of 8 patents, Okuda has made significant advancements in the field, particularly through his innovative designs and applications.

Latest Patents

One of Okuda's latest patents is a sputtering apparatus designed to prevent anomalous discharge during thin film deposition. This invention features a target presser that also serves as an earth shield and deposition preventing plate. The design includes an insulating member with a recess of varying depths, ensuring it does not contact the sputtering target or the backing plate. Another notable patent involves an optical recording medium that utilizes a half-transmissive film made from Cu oxide instead of Au, achieving similar reflectivity characteristics. This film can also incorporate various materials, including corrosion-resistant compounds and alloys.

Career Highlights

Okuda has spent a significant portion of his career at Matsushita Electric Industrial Co., Ltd., where he has been instrumental in developing cutting-edge technologies. His work has not only advanced the company's product offerings but has also contributed to the broader field of optical and electronic materials.

Collaborations

Throughout his career, Okuda has collaborated with notable colleagues, including Shigeru Namiki and Hatsuhiko Shibasaki. These partnerships have fostered a creative environment that has led to numerous innovations in their respective fields.

Conclusion

Akira Okuda's contributions to thin film technology and optical materials have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in technology.

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